cleanroom-metrology-controller

Cleanroom Metrology Controller

Purpose

The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.

Capabilities

• CD-SEM measurement recipes
• Spectroscopic ellipsometry analysis
• Film thickness mapping
• Surface profilometry
• Defect inspection
• Overlay measurement

Usage Guidelines

Metrology Control

1. CD-SEM Measurements

• Develop automated recipes
• Calibrate against reference
• Track process variation

1. Ellipsometry

• Select appropriate model
• Map thickness uniformity
• Characterize optical constants

1. Defect Inspection

• Set detection thresholds
• Classify defect types
• Track yield trends

Process Integration

• All fabrication processes
• Analysis Pipeline Validation

Input Schema

{
  "measurement_type": "cd_sem|ellipsometry|profilometry|defect",
  "target_parameter": "string",
  "wafer_map": {"sites": "number", "pattern": "string"},
  "specification": {
    "target": "number",
    "tolerance": "number"
  }
}

Output Schema

{
  "measurements": [{
    "site": "string",
    "value": "number",
    "unit": "string"
  }],
  "statistics": {
    "mean": "number",
    "std_dev": "number",
    "range": "number"
  },
  "uniformity": "number (%)",
  "pass_fail": "boolean",
  "trending_data": {"dates": [], "values": []}
}